@misc{indiciae0a3d452e491e,
  title = {Thermal Atomic Layer Etching of MoS 2 Using MoF 6 and H 2 O},
  author = {Soares, Jake and Mane, Anil U. and Choudhury, Devika and Letourneau, Steven and Hues, Steven M. and Elam, Jeffrey W. and Graugnard, Elton},
  year = {2023},
  doi = {10.1021/acs.chemmater.2c02549},
  url = {https://www.osti.gov/biblio/1908893},
  note = {Source identifier: 1908893}
}