@misc{indiciae69f9f3d92dbd,
  title = {Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution},
  author = {Ashley, Elizabeth M. and Duda, Peter J. and Nealey, Paul F.},
  year = {2021},
  doi = {10.1116/6.0001287},
  url = {https://www.osti.gov/biblio/1982935},
  note = {Source identifier: 1982935}
}