TY  - RPRT
TI  - Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution
AU  - Ashley, Elizabeth M.
AU  - Duda, Peter J.
AU  - Nealey, Paul F.
PY  - 2021
DO  - 10.1116/6.0001287
UR  - https://www.osti.gov/biblio/1982935
ID  - 1982935
ER  -