TY  - RPRT
TI  - Near-surface damage and mixing in Si-Cl 2 -Ar atomic layer etching processes: Insights from molecular dynamics simulations
AU  - Vella, Joseph R.
AU  - Graves, David B.
PY  - 2023
DO  - 10.1116/6.0002719
UR  - https://www.osti.gov/biblio/1999799
ID  - 1999799
ER  -