TY  - RPRT
TI  - Interface Trap Density Characterization of ALD Gate Dielectrics for GaN Power MOSFETs.
AU  - Glaser, Caleb
AU  - Rummel, Brian
AU  - Binder, Andrew
AU  - Yates, Luke
AU  - Allerman, Andrew
AU  - Feezell, Daniel
AU  - Kaplar, Robert
PY  - 2022
DO  - 10.2172/2003786
UR  - https://www.osti.gov/biblio/2003786
ID  - 2003786
ER  -