TY  - RPRT
TI  - Gate-control efficiency and interface state density evaluated from capacitance-frequency-temperature mapping for GaN-based metal-insulator-semiconductor devices
AU  - Shih, Hong-An
AU  - Kudo, Masahiro
AU  - Suzuki, Toshi-kazu
PY  - 2014
DO  - 10.1063/1.4901290
UR  - https://www.osti.gov/biblio/22402640
ID  - 22402640
ER  -