TY  - RPRT
TI  - Mitigating challenges in aberration-corrected electron-beam lithography on electron-opaque substrates
AU  - Camino, Fernando E.
AU  - Tiwale, Nikhil
AU  - Hwang, Sooyeon
AU  - Du, Xu
AU  - Yang, Judith C.
PY  - 2023
DO  - 10.1088/1361-6528/ad0908
UR  - https://www.osti.gov/biblio/2246882
ID  - 2246882
ER  -