@misc{indiciae74c5dd7e7c6a,
  title = {Recent developments in photoresists for extreme-ultraviolet lithography},
  author = {Ober, Christopher K. and Käfer, Florian and Yuan, Chenyun},
  year = {2023},
  doi = {10.1016/j.polymer.2023.126020},
  url = {https://www.osti.gov/biblio/2422594},
  note = {Source identifier: 2422594}
}