TY  - RPRT
TI  - Recent developments in photoresists for extreme-ultraviolet lithography
AU  - Ober, Christopher K.
AU  - Käfer, Florian
AU  - Yuan, Chenyun
PY  - 2023
DO  - 10.1016/j.polymer.2023.126020
UR  - https://www.osti.gov/biblio/2422594
ID  - 2422594
ER  -