@misc{indiciae449955e141bc,
  title = {Reactor wall effects in Si–Cl 2 –Ar atomic layer etching},
  author = {Vella, Joseph R. and Elgarhy, Mahmoud I. and Hao, Qinzhen and Donnelly, Vincent M. and Graves, David B.},
  year = {2024},
  doi = {10.1116/6.0003651},
  url = {https://www.osti.gov/biblio/2426348},
  note = {Source identifier: 2426348}
}