@misc{indiciae0f64a8693da2,
  title = {Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)},
  author = {Saifullah, Mohammad S. M. and Rajak, Anil Kumar and Hofhuis, Kevin A. and Tiwale, Nikhil and Mahfoud, Zackaria and Testino, Andrea and Karadan, Prajith and Vockenhuber, Michaela and Kazazis, Dimitrios and Valiyaveettil, Suresh and Ekinci, Yasin},
  year = {2024},
  doi = {10.1021/acsnano.4c03939},
  url = {https://www.osti.gov/biblio/2448263},
  note = {Source identifier: 2448263}
}