@misc{indiciae95271e938c4b,
  title = {Plasma sources for advanced semiconductor applications},
  author = {Versolato, Oscar [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Univ., Amsterdam (Netherlands)] (ORCID:0000000171226283) and Kaganovich, Igor [Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)] (ORCID:0000000306535682) and Bera, Kallol [Applied Materials, Inc., Santa Clara, CA (United States)] (ORCID:0000000299488098) and Lill, Thorsten [Lam Research Corporation, Fremont, CA (United States)] (ORCID:0000000186685247) and Lee, Hyo-Chang [Korea Aerospace University, Goyang (Korea, Republic of)] (ORCID:0000000327541512) and Hoekstra, Ronnie [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Univ. of Groningen (Netherlands)] (ORCID:0000000186323334) and Sheil, John [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Univ., Amsterdam (Netherlands)] (ORCID:0000000333939658) and Nam, Sang Ki [Samsung Electronics Corp. (Korea, Republic of)] (ORCID:0000000230382922)},
  year = {2024},
  doi = {10.1063/5.0247819},
  url = {https://www.osti.gov/biblio/2496686},
  note = {Source identifier: 2496686}
}