@misc{indiciaee6ce2c05dcfa,
  title = {Non-perturbative cathodoluminescence microscopy of beam-sensitive materials},
  author = {Bogroff, Malcolm [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:000900098688396X) and Cowley, Gabriel [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] and Nicastro, Ariel [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0009000424596539) and Levy, David [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0009000632492849) and Wu, Yueh-Chun [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] and Mao, Nannan [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)] (ORCID:0000000335225341) and Yang, Tilo H. [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)] and Zhang, Tianyi [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)] and Kong, Jing [Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)] and Vasudevan, Rama [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000346928579) and Kelley, Kyle P. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000276880484) and Lawrie, Benjamin J. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:000000031431066X)},
  year = {2025},
  doi = {10.1515/nanoph-2024-0724},
  url = {https://www.osti.gov/biblio/2526666},
  note = {Source identifier: 2526666}
}