@misc{indiciae82f8f8ba60e8,
  title = {Future of plasma etching for microelectronics: Challenges and opportunities},
  author = {Oehrlein, Gottlieb S. (ORCID:0000000266934274) and Brandstadter, Stephan M. and Bruce, Robert L. (ORCID:0000000255745603) and Chang, Jane P. (ORCID:0000000184825744) and DeMott, Jessica C. (ORCID:0009000489137966) and Donnelly, Vincent M. (ORCID:0000000158346678) and Dussart, Rémi (ORCID:0000000320015034) and Fischer, Andreas (ORCID:0000000273120041) and Gottscho, Richard A. (ORCID:0000000174845223) and Hamaguchi, Satoshi (ORCID:0000000165808797) and Honda, Masanobu (ORCID:0009000972344498) and Hori, Masaru (ORCID:0000000214420749) and Ishikawa, Kenji (ORCID:0000000282886620) and Jaloviar, Steven G. and Kanarik, Keren J. (ORCID:0000000225268500) and Karahashi, Kazuhiro (ORCID:0000000199516573) and Ko, Akiteru (ORCID:0009000666994601) and Kothari, Hiten and Kuboi, Nobuyuki (ORCID:0009000425424878) and Kushner, Mark J. (ORCID:0000000174378573) and Lill, Thorsten (ORCID:0000000186685247) and Luan, Pingshan (ORCID:0000000275306341) and Mesbah, Ali (ORCID:0000000217000600) and Miller, Eric and Nath, Shoubhanik (ORCID:0000000250260877) and Ohya, Yoshinobu (ORCID:0009000859555592) and Omura, Mitsuhiro (ORCID:0009000517867342) and Park, Chanhoon (ORCID:0009000705318324) and Poulose, John (ORCID:0000000252664437) and Rauf, Shahid (ORCID:0000000156896115) and Sekine, Makoto (ORCID:0000000327482436) and Smith, Taylor G. (ORCID:0000000210592316) and Stafford, Nathan (ORCID:0009000041071858) and Standaert, Theo (ORCID:0009000901324262) and Ventzek, Peter L. G.},
  year = {2024},
  doi = {10.1116/6.0003579},
  url = {https://www.osti.gov/biblio/2560935},
  note = {Source identifier: 2560935}
}