@misc{indiciae9da566ae4fad,
  title = {Plasma potential shaping using end-electrodes in the Large Plasma Device},
  author = {Gueroult, Renaud and Tripathi, S. K. P. and Gaboriau, F. and Look, T. R. and Fisch, N. J.},
  year = {2024},
  doi = {10.1017/s0022377824000552},
  url = {https://www.osti.gov/biblio/2565681},
  note = {Source identifier: 2565681}
}