@misc{indiciae8803f10ea9d1,
  title = {Si–Cl 2 –Ar + Atomic Layer Etching Window: A Fundamental Study Using Molecular Dynamics Simulations and a Reduced Order Model},
  author = {Vella, Joseph R. [TEL Technology Center, America, LLC, Albany, NY (United States)] (ORCID:0000000286668719) and Graves, David B. [Princeton Univ., NJ (United States)]},
  year = {2025},
  doi = {10.1021/acs.jpcb.5c01378},
  url = {https://www.osti.gov/biblio/2586627},
  note = {Source identifier: 2586627}
}