@misc{indiciaeba77ebb30342,
  title = {CFD Simulation of the Dosing Behavior within the Atomic Layer Deposition Feeding System},
  author = {Yuan, Yuchen [East China Univ. of Science and Technology, Shanghai (China)] and Ping, Huihui [East China Univ. of Science and Technology, Shanghai (China)] and Lee, Dennis T. [Johns Hopkins Univ., Baltimore, MD (United States)] (ORCID:0000000219762852) and Corkery, Peter [Johns Hopkins Univ., Baltimore, MD (United States)] and Zhang, Zhen [East China Univ. of Science and Technology, Shanghai (China)] (ORCID:000000034184654X) and Liu, Cui [East China Univ. of Science and Technology, Shanghai (China)] and Xue, Shuang-mei [Shenzhen Univ. (China)] and Zhuang, Liwei [East China Univ. of Science and Technology, Shanghai (China)] (ORCID:0000000232611872) and Tsapatsis, Michael [Johns Hopkins Univ., Baltimore, MD (United States)] (ORCID:0000000156103525)},
  year = {2023},
  doi = {10.1021/acs.iecr.3c01151},
  url = {https://www.osti.gov/biblio/2978639},
  note = {Source identifier: 2978639}
}