@misc{indiciaea28f54bfa75b,
  title = {PETSc/TAO Users Manual Revision 3.24},
  author = {Balay, S. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Abhyankar, S. [Argonne National Laboratory (ANL), Argonne, IL (United States); Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)] and Adams, M. F. [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)] and Brown, J. [Argonne National Laboratory (ANL), Argonne, IL (United States); Univ. of Colorado, Boulder, CO (United States)] and Brune, P. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Buschelman, K. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Constantinescu, E. M. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Dalcin, L. [King Abdullah University of Science and Technology (KAUST), Thuwal (Saudi Arabia)] and Benson, S. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Dener, A. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Eijkhout, V. [Univ. of Texas, Austin, TX (United States)] and Faibussowitsch, J. [Argonne National Laboratory (ANL), Argonne, IL (United States); Univ. of Illinois at Urbana-Champaign, IL (United States)] and Gropp, W. D. [Argonne National Laboratory (ANL), Argonne, IL (United States); Univ. of Illinois at Urbana-Champaign, IL (United States)] and Hapla, V. [Eidgenoessische Technische Hochschule (ETH), Zurich (Switzerland)] and Isaac, T. [Argonne National Laboratory (ANL), Argonne, IL (United States); Georgia Inst. of Technology, Atlanta, GA (United States)] and Jolivet, P. [Sorbonne Univ., Paris (France); Centre National de la Recherche Scientifique (CNRS) (France)] and Karpeev, D. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Kaushik, D. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Knepley, M. G. [Argonne National Laboratory (ANL), Argonne, IL (United States); State Univ. of New York at Buffalo, NY (United States)] and Kong, F. [Argonne National Laboratory (ANL), Argonne, IL (United States); Idaho National Laboratory (INL), Idaho Falls, ID (United States)] and Kruger, S. [Tech-X Corporation, Boulder, CO (United States)] and May, D. A. [Univ. of Oxford (United Kingdom); University of California, San Diego, CA (United States)] and McInnes, L. Curfman [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Mills, R. Tran [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Mitchell, L. [NVIDIA Corporation, Santa Clara, CA (United States); Durham Univ. (United Kingdom)] and Munson, T. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Roman, Jose E. [Universitat Politècnica de València, Valencia (Spain)] and Rupp, K. [Argonne National Laboratory (ANL), Argonne, IL (United States); Tsinghua Univ., Beijing (China). Inst. of Microelectronics] and Sanan, P. [Argonne National Laboratory (ANL), Argonne, IL (United States); Eidgenoessische Technische Hochschule (ETH), Zurich (Switzerland)] and Sarich, J. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Smith, B. F. [Argonne National Laboratory (ANL), Argonne, IL (United States); Flatiron Institute, New York, NY (United States)] and Suh, H. [Argonne National Laboratory (ANL), Argonne, IL (United States)] and Zampini, S. [King Abdullah University of Science and Technology (KAUST), Thuwal (Saudi Arabia)] and Zhang, H. [Argonne National Laboratory (ANL), Argonne, IL (United States); Illinois Institute of Technology, Chicago, IL (United States)] and Zhang, J. [Argonne National Laboratory (ANL), Argonne, IL (United States)]},
  year = {2025},
  doi = {10.2172/2998643},
  url = {https://www.osti.gov/biblio/2998643},
  note = {Source identifier: 2998643}
}