@misc{indiciae9f1fe8cf09b3,
  title = {Two-Dimensional Silk Crystal Films as Matrix Layer for High-Performance Microelectronics},
  author = {Zhang, Shuai [Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)] (ORCID:0000000301706470) and Tumeo, Antonino [Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)] and Shi, Chenyang [Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)] and Limaye, Ankur M. [Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)] (ORCID:0000000194062584) and Gajaria, Dhruv Mayur [Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)]},
  year = {2025},
  doi = {10.2172/2998651},
  url = {https://www.osti.gov/biblio/2998651},
  note = {Source identifier: 2998651}
}