@misc{indiciaed74d2cdb2120,
  title = {High-Intensity UV Exposure for the Rapid Screening of Silicon Photovoltaic Architectures},
  author = {Rasmussen, Mirra M. [Case Western Reserve University, Cleveland, OH (United States)] and Sempertegui, Jose Diego Zubieta [Case Western Reserve University, Cleveland, OH (United States)] and Moser-Mancewicz, Nicholas [Arizona State University, Tempe, AZ (United States)] and Bryan, Jonathan L. [GAF Energy, San Jose, CA (United States)] and Hjerrild, Natasha E. [GAF Energy, San Jose, CA (United States)] (ORCID:0000000232035086) and Davis, Kristopher O. [University of Central Florida, Orlando, FL (United States)] (ORCID:0000000257726254) and Bertoni, Mariana I. [Arizona State University, Tempe, AZ (United States)] (ORCID:000000020415837X) and Bruckman, Laura S. [Case Western Reserve University, Cleveland, OH (United States)] (ORCID:0000000312711072) and Martin, Ina T. [Case Western Reserve University, Cleveland, OH (United States)] (ORCID:0000000194523299)},
  year = {2025},
  doi = {10.1109/jphotov.2025.3611428},
  url = {https://www.osti.gov/biblio/3000480},
  note = {Source identifier: 3000480}
}