@misc{indiciaea98687338cc7,
  title = {Deposit and Evaluate Material Across Extremes of Process Windows},
  author = {Nandwana, Peeyush [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000251471668) and Dryepondt, Sebastien [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000312651612) and Massey, Caleb [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] and Bell, Sam [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000251905657) and Nayir, Selda [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000324578467) and Kumari, Geeta [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000230561621) and Joslin, Chase [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000246246511)},
  year = {2025},
  doi = {10.2172/3002565},
  url = {https://www.osti.gov/biblio/3002565},
  note = {Source identifier: 3002565}
}