@misc{indiciae9c9306446d8b,
  title = {Defect Engineering in Large‐Scale CVD‐Grown Hexagonal Boron Nitride: Formation, Spectroscopy, and Spin Relaxation Dynamics},
  author = {Vlassiouk, Ivan V. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000254940386) and Wu, Yueh‐Chun [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000292996882) and Puretzky, Alexander [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000299964429) and Liang, Liangbo [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000311990049) and Lasseter, John C. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] and Dryzhakov, Bogdan [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000221564396) and Gallagher, Ian [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000335045594) and Ghosh, Sujoy [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000328948971) and Lavrik, Nickolay [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000295435634) and Dyck, Ondrej [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000182009874) and Lupini, Andrew R. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000218747925) and Checa Nualart, Marti [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000326076866) and Collins, Liam [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000349469195) and Meyer III, Harry M. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000349941664) and Zhao, Huan [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000249820865) and Likhi, Farzana [Univ. of Houston, TX (United States)] and Xiao, Kai [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000204028276) and Ivanov, Ilia [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:0000000267262502) and Glasgow, David [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000263343639) and Tselev, Alexander [Univ. of Aveiro (Portugal)] and Lawrie, Benjamin [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)] (ORCID:000000031431066X) and Smirnov, Sergei N. [New Mexico State Univ., Las Cruces, NM (United States)] and Randolph, Steven J. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)]},
  year = {2025},
  doi = {10.1002/smll.202506874},
  url = {https://www.osti.gov/biblio/3010637},
  note = {Source identifier: 3010637}
}