@misc{indiciae83b3bc2bfbc1,
  title = {Modeling diffusion and depletion in high-aspect-ratio atomic layer deposition processes: Process parameters and manufacturing impacts},
  author = {Vogt, Victor A. [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0000000292988401) and Gayle, Andrew J. [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0000000348022439) and Mañón, Andrés Miranda [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0009000471085539) and Lenert, Andrej [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0000000211426627) and Dasgupta, Neil P. [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0000000251804063)},
  year = {2025},
  doi = {10.1116/6.0004702},
  url = {https://www.osti.gov/biblio/3010667},
  note = {Source identifier: 3010667}
}