TY  - RPRT
TI  - Modeling diffusion and depletion in high-aspect-ratio atomic layer deposition processes: Process parameters and manufacturing impacts
AU  - Vogt, Victor A. [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0000000292988401)
AU  - Gayle, Andrew J. [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0000000348022439)
AU  - Mañón, Andrés Miranda [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0009000471085539)
AU  - Lenert, Andrej [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0000000211426627)
AU  - Dasgupta, Neil P. [University of Michigan, Ann Arbor, MI (United States)] (ORCID:0000000251804063)
PY  - 2025
DO  - 10.1116/6.0004702
UR  - https://www.osti.gov/biblio/3010667
ID  - 3010667
ER  -