TY  - RPRT
TI  - The Complexation Properties of Self-Defensive Microgel-Modified Antimicrobial Surfaces
AU  - Guo, Yunhua [Stevens Institute of Technology, Hoboken, NJ (United States)]
AU  - Yin, Zhuozhuo [Stevens Institute of Technology, Hoboken, NJ (United States)]
AU  - Wang, Hongjun [Stevens Institute of Technology, Hoboken, NJ (United States)]
AU  - Paren, Benjamin [Stevens Institute of Technology, Hoboken, NJ (United States)] (ORCID:0000000243615182)
AU  - Wasik, Patryk [Brookhaven National Laboratory (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)] (ORCID:0000000274477472)
AU  - Wadurkar, Anand [Syracuse Univ., NY (United States)]
AU  - Ji, Jingjing [Syracuse Univ., NY (United States)]
AU  - Nangia, Shikha [Syracuse Univ., NY (United States)] (ORCID:0000000311708461)
AU  - Gill, Nicole [Binghamton Univ., NY (United States)]
AU  - Sauer, Karin [Binghamton Univ., NY (United States)]
AU  - Davies, David [Binghamton Univ., NY (United States)]
AU  - Marques, Cláudia N. H. [Binghamton Univ., NY (United States)] (ORCID:0000000328737074)
AU  - Libera, Matthew [Stevens Institute of Technology, Hoboken, NJ (United States)] (ORCID:000000015026802X)
PY  - 2026
DO  - 10.1021/acsabm.5c02096
UR  - https://www.osti.gov/biblio/3017374
ID  - 3017374
ER  -