@misc{indiciae760df02e3b04,
  title = {Binary pseudo-random array standard for extreme ultraviolet lithography tool characterization},
  author = {Benk, Markus [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)] and Yamada, Kaito [HighRi Optics, Oakland, CA (United States)] and Chao, Weilun [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)] and Lacey, Ian [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)] and Yashchuk, Valeriy [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)] and La Fontaine, Bruno [Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)] and Takacs, Peter [Surface Metrology Solutions, Minneapolis, MN (United States)] and Rochester, Simon [Rochester Scientific, LLC, El Cerrito, CA (United States)] and Munechika, Keiko [HighRi Optics, Inc., Oakland, CA (United States)]},
  year = {2026},
  doi = {10.1117/1.oe.65.1.014102},
  url = {https://www.osti.gov/biblio/3024370},
  note = {Source identifier: 3024370}
}