@misc{indiciae79e2149f7353,
  title = {Pitfalls in parameters: practical process development in chemical vapor processing of SiC},
  author = {Lamm, Benjamin W. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000340417786) and Ramirez, Valencia [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States); Georgia Institute of Technology, Atlanta, GA (United States)] (ORCID:0009000502222824) and Rogers, Alex [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000177046873) and Koyanagi, Takaaki [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000172724049)},
  year = {2026},
  doi = {10.1039/d5ta10109c},
  url = {https://www.osti.gov/biblio/3362858},
  note = {Source identifier: 3362858}
}