TY  - RPRT
TI  - Pitfalls in parameters: practical process development in chemical vapor processing of SiC
AU  - Lamm, Benjamin W. [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000340417786)
AU  - Ramirez, Valencia [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States); Georgia Institute of Technology, Atlanta, GA (United States)] (ORCID:0009000502222824)
AU  - Rogers, Alex [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000177046873)
AU  - Koyanagi, Takaaki [Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)] (ORCID:0000000172724049)
PY  - 2026
DO  - 10.1039/d5ta10109c
UR  - https://www.osti.gov/biblio/3362858
ID  - 3362858
ER  -