@misc{indiciae3da03eb86cf1,
  title = {Machine Learning an Ab-Initio Based Bond-Order Potential for Bismuthene},
  author = {Dutta, Partha Sarathi [Univ. of Illinois, Chicago, IL (United States); Argonne National Laboratory (ANL), Argonne, IL (United States). Center for Nanoscale Materials (CNM)] (ORCID:0000000165337454) and Koneru, Aditya [Univ. of Illinois, Chicago, IL (United States); Argonne National Laboratory (ANL), Argonne, IL (United States). Center for Nanoscale Materials (CNM)] (ORCID:0000000263211900) and Muhammed, Adil [Univ. of Illinois, Chicago, IL (United States); Argonne National Laboratory (ANL), Argonne, IL (United States). Center for Nanoscale Materials (CNM)] and Chan, Henry [Argonne National Laboratory (ANL), Argonne, IL (United States). Center for Nanoscale Materials (CNM)] (ORCID:0000000281987737) and Balasubramanian, Karthik [Univ. of Illinois, Chicago, IL (United States); Argonne National Laboratory (ANL), Argonne, IL (United States). Center for Nanoscale Materials (CNM)] and Manna, Sukriti [Univ. of Illinois, Chicago, IL (United States); Argonne National Laboratory (ANL), Argonne, IL (United States). Center for Nanoscale Materials (CNM)] (ORCID:0000000231937803) and Loeffler, Troy [Univ. of Illinois, Chicago, IL (United States); Argonne National Laboratory (ANL), Argonne, IL (United States). Center for Nanoscale Materials (CNM)] (ORCID:0000000302441793) and Sasikumar, Kiran [Avant-Garde Materials Simulation Deutschland GmbH (Germany)] and Darancet, Pierre [Argonne National Laboratory (ANL), Argonne, IL (United States). Center for Nanoscale Materials (CNM)] (ORCID:0000000258461673) and Sankaranarayanan, Subramanian K. R. S. [Univ. of Illinois, Chicago, IL (United States); Argonne National Laboratory (ANL), Argonne, IL (United States). Center for Nanoscale Materials (CNM)] (ORCID:000000029708396X)},
  year = {2026},
  doi = {10.1021/acs.jpcc.5c08318},
  url = {https://www.osti.gov/biblio/3367750},
  note = {Source identifier: 3367750}
}