@misc{indiciae98408428cd18,
  title = {Site-specific surface reactivity on SnO 2 : Evaluating selective atomic layer deposition processes},
  author = {Xu, Jiayi [Argonne National Laboratory (ANL), Argonne, IL (United States)] (ORCID:0000000317636251) and Muir, Mark [Argonne National Laboratory (ANL), Argonne, IL (United States)] (ORCID:0000000318900579) and Kamphaus, Ethan Philip [Argonne National Laboratory (ANL), Argonne, IL (United States)] (ORCID:0000000158212223) and Jones, Jessica Catharine [Argonne National Laboratory (ANL), Argonne, IL (United States)] (ORCID:0000000174754620) and Martinson, Alex B. F. [Argonne National Laboratory (ANL), Argonne, IL (United States)] (ORCID:0000000339161672) and Liu, Cong [Argonne National Laboratory (ANL), Argonne, IL (United States)] (ORCID:0000000221455034)},
  year = {2025},
  doi = {10.1016/j.apsusc.2025.162966},
  url = {https://www.osti.gov/biblio/3374486},
  note = {Source identifier: 3374486}
}