@misc{indiciaefa19a3b06d20,
  title = {Surrogate models to optimize plasma-assisted atomic layer deposition in high aspect ratio features},
  author = {Yanguas-Gil, Angel [Argonne National Laboratory (ANL), Lemont, IL (United States)] (ORCID:0000000182073825) and Elam, Jeffrey W. [Argonne National Laboratory (ANL), Lemont, IL (United States)] (ORCID:0000000258612996)},
  year = {2025},
  doi = {10.1063/5.0275766},
  url = {https://www.osti.gov/biblio/3374938},
  note = {Source identifier: 3374938}
}