@misc{indiciae638c755e87f7,
  title = {Low thermal budget dopant activation in shallow junctions of implanted Si via Tunable plasma enhanced annealing},
  author = {Ma, Zhihao [Univ. of Texas at Dallas, Richardson, TX (United States)] (ORCID:0009000386249666) and Shekarnoush, Mahsa [MicroSol Technologies Inc., Plano, TX (United States)] and Tian, Yafen [MicroSol Technologies Inc., Plano, TX (United States)] and Chen, Yuanning [MicroSol Technologies Inc., Plano, TX (United States)] and Bevan, Malcolm [MicroSol Technologies Inc., Plano, TX (United States)] and Stiegler, Harvey [MicroSol Technologies Inc., Plano, TX (United States)] and Overzet, Lawrence J. [Univ. of Texas at Dallas, Richardson, TX (United States)] (ORCID:0000000172770387)},
  year = {2027},
  doi = {10.1016/j.apsusc.2026.168201},
  url = {https://www.osti.gov/biblio/3757816},
  note = {Source identifier: 3757816}
}