@misc{indiciae998cee191ead,
  title = {EUV mask surface cleaning effects on lithography process performance},
  author = {George, Simi and Baclea-an, Lorie Mae and Naulleau, Patrick and Chen, Robert J and Liang, Ted},
  year = {2010},
  url = {https://www.osti.gov/biblio/989848},
  note = {Source identifier: 989848}
}