NASA NTRS · 19680036263
Process techniques and radiation effects in metal insulator semiconductor structures.
Abstract
Interrelation between sensitivity to radiation in MOS devices and gate oxide film processing, considering steam growth and dry oxygen growth oxides
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Dennehy, W. J., Holmes-Siedle, A. G., Zaininger, K. H.. 1967-12-01. Process techniques and radiation effects in metal insulator semiconductor structures.. https://ntrs.nasa.gov/citations/19680036263
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