NASA NTRS · 19690000361
Improved vacuum deposition apparatus
Abstract
Improved apparatus enables vacuum deposition of thick metal films on the inside surface of a cylinder. The evaporant is deposited to a uniform thickness and distribution on the inside surface of the substrate without imperfections that would otherwise result from droplet formation.
Keep this discovery
Explore connections, maps & timelines
Erpenbach, H.. 1969-09-01. Improved vacuum deposition apparatus. https://ntrs.nasa.gov/citations/19690000361
Cite the original work for its findings. Save a collection to share your selection of sources.