NASA NTRS · 19710038365
Ion implantation damage effects in silicon
Abstract
Ion implantation lattice damage effects in crystalline silicon with allowance for optical reflectivity, considering annealing temperature and amorphous layer formation
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Eberle, D. E.. 1970-12-01. Ion implantation damage effects in silicon. https://ntrs.nasa.gov/citations/19710038365
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