NASA NTRS · 19720000744
Improved photoetching fabrication method
Abstract
Photoetching method producing well-defined lines with minimum undercutting was developed for etching coolant passages in nickel sheet. Phosphate coating is applied over conventional silver plate maskant and phosphoric acid solution is used to remove silver maskant. Phosphoric acid prevents etching of silver edges and mask has sharply-defined lines.
Keep this discovery
Explore connections, maps & timelines
Kistler, C. L.. 1972-12-01. Improved photoetching fabrication method. https://ntrs.nasa.gov/citations/19720000744
Cite the original work for its findings. Save a collection to share your selection of sources.