NASA NTRS · 19720032050
Annealing effects in plated-wire memory elements. II - Recrystallization in Permalloy films.
Abstract
Results of grain-size measurements in Permalloy platings suggest that recrystallization is possible at temperatures as low as 200 C, but that it is an extremely heterogeneous process. No worthwhile correlation was found to exist between observed grain size and magnetic dispersion in samples aged in the temperature range from 180 to 230 C. It is suggested that the magnetic aging which occurs under these conditions may be due to some other diffusion-controlled process than recrystallization; a process such as chemical homogenization is tentatively preferred.
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Marquardt, S. J., Kench, J. R.. 1971-12-01. Annealing effects in plated-wire memory elements. II - Recrystallization in Permalloy films.. https://ntrs.nasa.gov/citations/19720032050
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