NASA NTRS · 19730007759
Development of techniques for advanced optical contamination measurement with internal reflection spectroscopy, phase 2, volume 2
Abstract
Attenuated total reflectance spectra of individual contaminants in space simulation chambers are presented as well as spectra of mixtures and figures exhibiting the effects of film thickness on reflectance spectra. Detailed calibration spectra were made for three selected concentrations (film thickness) for two contaminants and for one concentration for all contaminants.
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Hayes, J. D.. 1972-12-01. Development of techniques for advanced optical contamination measurement with internal reflection spectroscopy, phase 2, volume 2. https://ntrs.nasa.gov/citations/19730007759
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