NASA NTRS · 19730007789
Improvement of screening methods for silicon planar semiconductor devices
Abstract
The results of the program for the development of a more sensitive method for selecting silicon planar semiconductor devices for long life applications are reported. The manufacturing technologies (MOS and Bipolar) are discussed along with the screening procedures developed as a result of the tests and evaluations, and the effectiveness of the MOS and Bilayer screening procedures are evaluated.
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Berger, W. M.. 1972-09-01. Improvement of screening methods for silicon planar semiconductor devices. https://ntrs.nasa.gov/citations/19730007789
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