NASA NTRS · 19760010307
Ion plating with an induction heating source
Abstract
Induction heating is introduced as an evaporation heat source in ion plating. A bare induction coil without shielding can be directly used in the glow discharge region with no arcing. The only requirement is to utilize an rf inductive generator with low operating frequency of 75 kHz. Mechanical simplicity of the ion plating apparatus and ease of operation is a great asset for industrial applications; practically any metal such as nickel, iron, and the high temperature refractories can be evaporated and ion plated.
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Spalvins, T., Brainard, W. A.. 1976-01-01. Ion plating with an induction heating source. https://ntrs.nasa.gov/citations/19760010307
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