NASA NTRS · 19770038348
Binary phase digital reflection holograms - Fabrication and potential applications
Abstract
A novel technique for the fabrication of binary-phase computer-generated reflection holograms is described. By use of integrated circuit technology, the holographic pattern is etched into a silicon wafer and then aluminum coated to make a reflection hologram. Because these holograms reflect virtually all the incident radiation, they may find application in machining with high-power lasers. A number of possible modifications of the hologram fabrication procedure are discussed.
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Gallagher, N. C., Jr., Angus, J. C., Coffield, F. E., Edwards, R. V., Mann, J. A., Jr.. 1977-02-01. Binary phase digital reflection holograms - Fabrication and potential applications. https://ntrs.nasa.gov/citations/19770038348
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