NASA NTRS · 19780000357
Ion-beam texturing of materials
Abstract
Xenon ion-beam source is used to create microscopically-rough surface texture by sputter-etching surface while simultaneously sputter depositing lower yield material onto surface.
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Hudson, W. R.. 1979-01-01. Ion-beam texturing of materials. https://ntrs.nasa.gov/citations/19780000357
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