NASA NTRS ยท 19790000434
Photomask and pattern programs
Abstract
Package of computer programs helps designers with layout and graphics of photomasks. Photomasks are specifically useful to applications involving fine reproducibility, repetition, and fabrication on planar surfaces of materials, items fabricated from photomasks include circuit boards, magnetic bubble devices and integrated optic circuits.
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Kirschman, R. K.. 1980-04-01. Photomask and pattern programs. https://ntrs.nasa.gov/citations/19790000434
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