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NASA NTRS ยท 19790000434

Photomask and pattern programs

Abstract

Package of computer programs helps designers with layout and graphics of photomasks. Photomasks are specifically useful to applications involving fine reproducibility, repetition, and fabrication on planar surfaces of materials, items fabricated from photomasks include circuit boards, magnetic bubble devices and integrated optic circuits.

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BibTeXRIS

Kirschman, R. K.. 1980-04-01. Photomask and pattern programs. https://ntrs.nasa.gov/citations/19790000434

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