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NASA NTRS · 19820007449

Gallium phosphide high temperature diodes

Abstract

High temperature (300 C) diodes for geothermal and other energy applications were developed. A comparison of reverse leakage currents of Si, GaAs, and GaP was made. Diodes made from GaP should be usable to 500 C. A Liquid Phase Epitaxy (LPE) process for producing high quality, grown junction GaP diodes is described. This process uses low vapor pressure Mg as a dopant which allows multiple boat growth in the same LPE run. These LPE wafers were cut into die and metallized to make the diodes. These diodes produce leakage currents below ten to the -9th power A/sq cm at 400 C while exhibiting good high temperature rectification characteristics. High temperature life test data is presented which shows exceptional stability of the V-I characteristics.

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BibTeXRIS

Chaffin, R. J., Dawson, L. R.. 1981-01-01. Gallium phosphide high temperature diodes. https://ntrs.nasa.gov/citations/19820007449

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