NASA NTRS ยท 19830000151
Solvent-Resistant Polysulfones
Abstract
Polysulfones terminated with trimethylsilylethynyl, ethynyl, and phenylethynyl groups increased solvent resistance. Upon application of heat, with or without catalyst, end groups react to provide cross linking and chain extension. Result: temperature of polymer increased, more importantly, solvent resistance greatly improved. Solutions used conveniently for preparation of films, coatings, membranes, prepreg, and adhesive tapes.
Keep this discovery
Explore connections, maps & timelines
Hergenrother, P. M.. 1983-10-01. Solvent-Resistant Polysulfones. https://ntrs.nasa.gov/citations/19830000151
Cite the original work for its findings. Save a collection to share your selection of sources.