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NASA NTRS ยท 19830000151

Solvent-Resistant Polysulfones

Abstract

Polysulfones terminated with trimethylsilylethynyl, ethynyl, and phenylethynyl groups increased solvent resistance. Upon application of heat, with or without catalyst, end groups react to provide cross linking and chain extension. Result: temperature of polymer increased, more importantly, solvent resistance greatly improved. Solutions used conveniently for preparation of films, coatings, membranes, prepreg, and adhesive tapes.

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BibTeXRIS

Hergenrother, P. M.. 1983-10-01. Solvent-Resistant Polysulfones. https://ntrs.nasa.gov/citations/19830000151

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