NASA NTRS ยท 19840020558
Orientation and Morphology Effects in Rapid Silicon Sheet Solidification
Abstract
Radial growth anisotropies and equilibrium forms of point nucleated, dislocation free silicon sheets spreading horizontally on the free surface of a silicon melt were measured for (100), (110), (111), and (112) sheet planes. The growth process was recorded. Qualitative Wulff surface free energy polar plots were deduced from the equilibrium shapes for each sheet plane. Predicted geometries for the tip shape of unidirectional, dislocation free, horizontally grown sheets growing in various directions within the planes were analyzed. Polycrystalline sheets and dendrite propagation were analyzed. For dendrites, growth rates on the order of 2.5 m/min and growth rate anisotropies of 25 are measured.
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Ciszek, T. F.. 1984-04-15. Orientation and Morphology Effects in Rapid Silicon Sheet Solidification. https://ntrs.nasa.gov/citations/19840020558
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