NASA NTRS ยท 19840020561
Edge Stabilized Ribbon (ESR); Stress, Dislocation Density and Electronic Performance
Abstract
The edge stabilized ribbon (ESR) silicon ribbon was grown in widths of 1, 2.2 and 4.0 inches at speeds ranging from .6 to 7 in/min, which result in ribbon thicknesses of 5 to 400 microns. One of the primary problems remaining in ESR growth is that of thermally induced mechanical stresses. This problem is manifested as ribbon with a high degree of residual stress or as ribbon with buckled ribbon. Thermal stresses result in a high dislocation density in the grown material, resulting in compromised electronic performance. Improvements in ribbon flatness were accomplished by modification of the ribbon cooling profile. Ribbon flatness and other experimental observations of ESR ribbon are discussed. Laser scanner measurements show a good correlation between diffusion length and dislocation density which indicates that the high dislocation densities are the primary cause of the poor current performance of ESR materials. Dislocation densities were reduced and improved electronic performance resulted. Laser scanner data on new and old material are presented.
Keep this discovery
Explore connections, maps & timelines
Sachs, E. M.. 1984-04-15. Edge Stabilized Ribbon (ESR); Stress, Dislocation Density and Electronic Performance. https://ntrs.nasa.gov/citations/19840020561
Cite the original work for its findings. Save a collection to share your selection of sources.