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NASA NTRS · 19840020572

A High-speed Characterization Technique for Solar Silicon

Abstract

High-speed crystal growth techniques demand high-speed characterization techniques to allow a timely feed-back of information to the crystal growers. The unique properties of the Si electrolyte-contact (SEC) provide for an extremely fast and simple measurement of the light-induced photo-current for any piece of Si without lengthy preparation of the specimen. Electropolishing at high anodic current densities allows for insitu generation of fresh surfaces whereas preferential etching of defects in various modes is possible at low current densities. In n-type Si a simple estimation of the minority-carrier diffusion length is possible in many cases. Laser-scanning enables local probing of the photocurrent and provides data about the homogeneity of a sample. The experimental realization of the method is described in detail and examples are given and discussed.

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BibTeXRIS

Lehmann, V., Foell, H., Bernewitz, L., Grabmaier, J. G.. 1984-04-15. A High-speed Characterization Technique for Solar Silicon. https://ntrs.nasa.gov/citations/19840020572

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