A new technique for measuring sputtering yields at high energies

Qiu, Y.; Griffith, J. E.; Tombrello, T. A.

NASA NTRS · 19840062787

A new technique for measuring sputtering yields at high energies

Qiu, Y.·Griffith, J. E.·Tombrello, T. A.

Abstract

The use of thin, self-supporting carbon catcher foils allows one to measure sputtering yields in a broad range of materials with high sensitivity. Analyzing the foils with Rutherford forward scattering, sputtered Al, Si and P surface densities down to 5 x 10 to the 13th per sq cm with uncertainties of about 20 percent have been measured.

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Qiu, Y., Griffith, J. E., Tombrello, T. A.. 1984-01-01. A new technique for measuring sputtering yields at high energies. https://ntrs.nasa.gov/citations/19840062787

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